TY  - JOUR

T1  - Controlled-width track in through silicon via using 3D holographic photolithography with modified electrodepositable photoresist

JO  - J MICROMECH MICROENG

PY  - 2010/01/01

AU  - Toriz-Garcia JJ

AU  - Williams GL

AU  - McWilliam R

AU  - Curry R

AU  - Seed NL

AU  - Purvis A

AU  - Ivey PA

ED  - 

DO  - DOI: 10.1088/0960-1317/20/1/015012

VL  - 20

IS  - 1

Y2  - 2024/12/22

ER  -