TY  - JOUR

T1  - Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat the Diffraction Limit

JO  - Physical Review Letters

PY  - 2000/09/25

AU  - Boto AN

AU  - Kok P

AU  - Abrams DS

AU  - Braunstein SL

AU  - Williams CP

AU  - Dowling JP

ED  - 

DO  - DOI: 10.1103/physrevlett.85.2733

PB  - American Physical Society (APS)

VL  - 85

IS  - 13

SP  - 2733

EP  - 2736

Y2  - 2024/12/22

ER  -