@article{article, title  = {{Role of Positive Ions in Determining the Deposition Rate and Film Chemistry of Continuous Wave Hexamethyl Disiloxane Plasmas}},

 publisher = {{American Chemical Society (ACS)}},

 url = {{http://dx.doi.org/10.1021/la202010n }},

 year = {{2011}},

 month = {{9}},

 author = {{Michelmore A and Bryant PM and Steele DA and Vasilev K and Bradley JW and Short RD}},

 doi = {{10.1021/la202010n}},

 volume = {{27}},

 journal = {{Langmuir}},

 issue = {{19}},

 pages = {{11943-11950}},

 note = {{Accessed on 2024/12/22}}}