TY  - JOUR

T1  - Epitaxial growth of relaxed germanium layers by reduced pressure chemical vapour deposition on (110) and (111) silicon substrates

JO  - Thin Solid Films

PY  - 2011/01/01

AU  - Nguyen VH

AU  - Dobbie A

AU  - Myronov M

AU  - Norris DJ

AU  - Walther T

AU  - Leadley DR

ED  - 

Y2  - 2024/12/22

ER  -